Tetrapropylammonium hydroxide solution

5% in H2O

Reagent Code: #128848
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CAS Number 4499-86-9

science Other reagents with same CAS 4499-86-9

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 203.36 g/mol
Formula C₁₂H₂₉NO
badge Registry Numbers
MDL Number MFCD00009360
inventory_2 Storage & Handling
Storage Room temperature

description Product Description

Used as a phase transfer catalyst in organic synthesis, facilitating reactions between compounds in different phases by transferring reactants across interfaces. Commonly employed in the preparation of fine chemicals, pharmaceuticals, and agrochemicals where efficient mixing of aqueous and organic phases is required. Also utilized in the synthesis of zeolites and mesoporous materials as a structure-directing agent, helping to control pore size and framework formation. In analytical chemistry, it serves as a mobile phase additive in chromatography to improve peak resolution. Additionally, applied in surface treatment processes for semiconductors and electronic materials due to its ability to provide controlled alkaline conditions.

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Test Parameter Specification
Appearance Liquid
Concentration (%) 4.9-5.1
Solvent H2O

shopping_cart Available Sizes & Pricing

Size Availability Unit Price Quantity
inventory 25ml
10-20 days ฿750.00
inventory 100ml
10-20 days ฿2,100.00
inventory 500ml
10-20 days ฿5,200.00

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Tetrapropylammonium hydroxide solution
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Used as a phase transfer catalyst in organic synthesis, facilitating reactions between compounds in different phases by transferring reactants across interfaces. Commonly employed in the preparation of fine chemicals, pharmaceuticals, and agrochemicals where efficient mixing of aqueous and organic phases is required. Also utilized in the synthesis of zeolites and mesoporous materials as a structure-directing agent, helping to control pore size and framework formation. In analytical chemistry, it serves as a mobile phase additive in chromatography to improve peak resolution. Additionally, applied in surface treatment processes for semiconductors and electronic materials due to its ability to provide controlled alkaline conditions.
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