Used as a precursor in chemical vapor deposition (CVD) to produce tungsten metal films for semiconductor manufacturing. These thin films serve as conductive layers in integrated circuits and microelectronic devices. Also employed in the synthesis of tungsten-containing catalysts and organometallic complexes. Its volatility and thermal stability make it suitable for applications requiring controlled decomposition into pure tungsten. Additionally, used in research for nanoparticle fabrication and surface coating technologies.