4-(Trifluoromethyl)phenacyl Bromide

95%

Reagent Code: #240520
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CAS Number 383-53-9

science Other reagents with same CAS 383-53-9

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 267.05 g/mol
Formula C₉H₆BrF₃O
badge Registry Numbers
MDL Number MFCD00126489
thermostat Physical Properties
Melting Point 46-56°C (Lit.)
inventory_2 Storage & Handling
Storage 2~8°C, sealed

description Product Description

Used primarily as a photolabile protecting group in organic synthesis, enabling controlled release of carboxylic acids, phosphates, and other functional groups upon exposure to light. Its application is prominent in the development of light-triggered drug delivery systems and in the synthesis of complex biomolecules where selective deprotection is required. The electron-withdrawing trifluoromethyl group enhances the efficiency of photolysis, making it effective even at longer wavelengths. Also employed in photochemical studies and the preparation of photoresponsive materials.

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Size Availability Unit Price Quantity
inventory 5g
10-20 days ฿660.00
inventory 25g
10-20 days ฿3,220.00
inventory 100g
10-20 days ฿12,820.00

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4-(Trifluoromethyl)phenacyl Bromide
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Used primarily as a photolabile protecting group in organic synthesis, enabling controlled release of carboxylic acids, phosphates, and other functional groups upon exposure to light. Its application is prominent in the development of light-triggered drug delivery systems and in the synthesis of complex biomolecules where selective deprotection is required. The electron-withdrawing trifluoromethyl group enhances the efficiency of photolysis, making it effective even at longer wavelengths. Also employed i

Used primarily as a photolabile protecting group in organic synthesis, enabling controlled release of carboxylic acids, phosphates, and other functional groups upon exposure to light. Its application is prominent in the development of light-triggered drug delivery systems and in the synthesis of complex biomolecules where selective deprotection is required. The electron-withdrawing trifluoromethyl group enhances the efficiency of photolysis, making it effective even at longer wavelengths. Also employed in photochemical studies and the preparation of photoresponsive materials.

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