Tantalum(V) chloride is primarily used as a precursor in the production of tantalum-containing materials. It plays a key role in chemical vapor deposition (CVD) processes to form thin films of tantalum or tantalum compounds, which are essential in semiconductor manufacturing and microelectronics. These films serve as diffusion barriers or conductive layers in advanced integrated circuits.

It is also employed in the synthesis of other tantalum derivatives used in catalysts for organic reactions, particularly in the formation of carbon-carbon bonds. Due to its reactivity with oxygen and moisture, it is effective in research settings for developing new inorganic and organometallic compounds.

Additionally, tantalum(V) chloride finds use in the preparation of tantalum-based oxides and nitrides, which have applications in high-performance capacitors, optical coatings, and corrosion-resistant coatings in aggressive environments.