Used primarily in the semiconductor industry as a precursor for chemical vapor deposition (CVD) of tantalum-containing thin films, such as Ta and TaN. These films serve as diffusion barriers and conductive layers in advanced microelectronic devices, especially in integrated circuits. Also employed in the synthesis of other tantalum-based compounds. Acts as a Lewis acid catalyst in organic synthesis, particularly for functionalizing aromatic compounds. Its high reactivity makes it suitable for research applications involving metal-organic frameworks and specialty ceramics. Requires careful handling due to moisture sensitivity and corrosive byproducts.