Used primarily as a precursor in chemical vapor deposition (CVD) processes to produce thin films of tungsten metal. These films are essential in semiconductor manufacturing for creating conductive layers in integrated circuits. The compound decomposes upon heating, releasing tungsten in a controlled manner, which allows for uniform and precise coating on silicon wafers. It is also employed in the synthesis of other tungsten-containing compounds and catalysts. Due to its volatility and thermal stability, it is suitable for applications requiring high purity metal deposits. Additionally, it finds use in research for organometallic chemistry and nanomaterial fabrication.