Poly(α-methylstyrene) is a specialty polymer valued for its unique thermal depolymerization properties, decomposing cleanly back to its monomer at relatively low temperatures (around 200-250°C) without leaving residue. It is primarily used in the electronics industry, particularly in microlithography for semiconductor manufacturing. As a key component in photoresist formulations, especially bilayer resist systems, it enables precise patterning and lift-off processes in microchip fabrication. Its high purity and stability make it ideal for applications requiring high-resolution imaging and clean removal, such as in the production of integrated circuits and thin-film devices. Additionally, it serves as a sacrificial material in advanced coating and adhesive formulations where thermal recyclability is essential.