Surface Modifiers

Phosphonic Acid Derivatives

Silane Derivatives

Surface Modifiers

Silane Derivatives

Silicon Precursors

POSS Compounds

Silicon Precursors

Carbon Nanotubes

REAGENT

PEG POSS Cage Mixture

CAS:1255649-48-9

฿25,950.00

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REAGENT

Proto-pb

≥98%

CAS:53093-47-3

Formula:C₅₇H₉₄O₂₆

MW:1195.35 g/mol

฿48,790.00

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REAGENT

3-[2-(Perfluorohexyl)ethoxy]-1,2-epoxypropane

96%

CAS:122193-68-4

Formula:C₁₁H₉F₁₃O₂

MW:420.17 g/mol

฿3,830.00

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REAGENT

PSS-Allyl-Heptaisobutyl substituted

CAS:351003-00-4

Formula:C₃₁H₆₈O₁₂Si₈

MW:857.55 g/mol

฿14,200.00

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REAGENT

γ-Piperazinylpropylmethyldimethoxysilane

95%

CAS:128996-12-3

Formula:C₁₀H₂₄N₂O₂Si

MW:232.4 g/mol

฿690.00

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REAGENT

1,4-Phenylenediphosphonic Acid

95%

CAS:880-68-2

Formula:C₆H₈O₆P₂

MW:2387 g/mol

฿5,680.00

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REAGENT

4,4,5,5,5-Pentafluoro-1-pentanethiol

99%

CAS:148757-88-4

Formula:C₅H₇F₅S

MW:194.17 g/mol

฿2,240.00

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REAGENT

P-Trichlorosilylbiphenyl

95%

CAS:18030-61-0

Formula:C₁₂H₉Cl₃Si

MW:287.6444 g/mol

฿11,610.00

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REAGENT

2-Propenoic acid, (triethoxysilyl)methyl ester

95%

CAS:78884-71-6

Formula:C₁₀H₂₀O₅Si

MW:248.35 g/mol

฿2,400.00

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REAGENT

[4-(4-phosphonophenyl)phenyl]phosphonic acid

97%

CAS:13817-79-3

Formula:C₁₂H₁₂O₆P₂

MW:314.16 g/mol

฿2,930.00

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